Top Pick Mse Pro Zirconium Sputtering Target Zr - Ends Soon [iOD9tBQm]

Top Pick Mse Pro Zirconium Sputtering Target Zr - Ends Soon [iOD9tBQm]

MSE PRO Zirconium Sputtering Target, with its high purity and exceptional corrosion resistance, is a leading choice for advanced sputtering applications. This target is meticulously crafted to deliver the highest quality performance in various industries, including semiconductor, chemical, and nuclear. Its robustness and consistent properties make it an ideal material for sputter coating processes.

Key Specifications and Features

The MSE PRO Zirconium Sputtering Target boasts a purity of 99.2% (Grade 702) and 99.95% (low Hf, Hf < 100ppm), ensuring the highest level of material integrity. Its hexagonal crystal structure and density of 6.49 g/cm³ at 293 K contribute to its exceptional sputtering efficiency. This target is designed to withstand extreme temperatures, with a melting point of 1852.0 °C and a boiling point of 4377.0 °C, making it suitable for high-temperature applications. Key features include:

• Purity: 99.2% (Grade 702), 99.95% (low Hf)
• Crystal Structure: Hexagonal
• Density: 6.49 g/cm³ at 293 K
• Melting Point: 1852.0 °C
• Boiling Point: 4377.0 °C

Applications and Benefits

The MSE PRO Zirconium Sputtering Target finds extensive use in industries where corrosion resistance and high-temperature performance are critical. Its applications include semiconductor device fabrication, chemical processing equipment, and nuclear reactor construction. The benefits of using this target are numerous:

• Corrosion Resistance: The target's ability to form a stable zirconium oxide film on its surface makes it highly resistant to corrosive environments.
• High Temperature Stability: The target maintains its integrity at extreme temperatures, making it suitable for high-temperature applications.
• Customization: MSE Supplies LLC offers both standard and customized zirconium metal sputtering targets to meet various customer requirements.