Eye-catching Reflectance Spectrometer For Film Thickness Measurement From 15nm To 50 Um - Tfms-ld 85% Off - Today Only [X3WrhzVJ]
Accurate Film Thickness Measurement with TFMS-LDThe TFMS-LD Reflectance Spectrometer is an advanced tool designed for precise film thickness measurement, catering to a wide range of applications. This compact and user-friendly system provides a quick
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Eye-catching Reflectance Spectrometer For Film Thickness Measurement From 15nm To 50 Um - Tfms-ld 85% Off - Today Only [X3WrhzVJ]
Accurate Film Thickness Measurement with TFMS-LD
The TFMS-LD Reflectance Spectrometer is an advanced tool designed for precise film thickness measurement, catering to a wide range of applications. This compact and user-friendly system provides a quick and reliable solution for measuring translucent or low-absorbing thin films from 15 nm to 50 μm. With its extensive material library and support for parameterized materials, the TFMS-LD is capable of analyzing complex film stacks and offering real-time measurement and analysis of multi-layer, thin, thick, freestanding, and non-uniform layers. Its versatility makes it suitable for desktop or in-situ use, in R&D or inline processes.- Real-time measurement and analysis: Handle various film types with ease.
- Extensive material library: Over 500 materials supported for accurate readings.
Technical Specifications and Capabilities
The TFMS-LD boasts a spectral range of 400 nm to 1100 nm, ensuring comprehensive analysis of a wide range of materials. With a precision of 0.01 nm or 0.01% and an accuracy of 0.2% or 1 nm, the TFMS-LD guarantees reliable and consistent results. The system is equipped with a fiber optics reflectance probe and a 5 W tungsten-halogen light source, providing efficient and stable measurements. Additionally, the TFMS-LD includes a large library of refractive index and extinction coefficient values for common materials, enabling accurate analysis of film stacks.- Spectral Range: 400 nm - 1100 nm for comprehensive analysis.
- Spot Size: 2 mm minimum for reliable measurements.
Applications and Benefits
The TFMS-LD is a versatile tool suitable for various industries, including semiconductor manufacturing, material research, and thin film coating applications. Its ability to measure a wide range of materials, from oxides and nitrides to polymers and semiconductors, makes it an invaluable asset in R&D and production environments. The system's user-friendly interface and powerful software, TFCompanion, ensure ease of use and efficient data analysis. With its compact design and included laptop computer, the TFMS-LD is a convenient solution for professionals seeking accurate and reliable film thickness measurements.- Industries: Semiconductor, material research, and thin film coating.
- Software: TFCompanion for comprehensive data analysis.
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