Finally Era-chrom Eratx 120 Si 3 µm 250 Mm X 4.0 Mm P/n:era000686 Gift Boxed [SnNajkPp]

ERA-Chrom eraTX 120 Si 3 µm

Introducing the ERA-Chrom eraTX 120 Si 3 µm, a state-of-the-art photomask for your precision engineering needs. This advanced mask offers unparalleled performance with its 3 µm resolution, making it ideal for intricate designs and critical applications. The ERA-Chrom eraTX series is renowned for its exceptional quality, and the 120 Si version is no exception. With a substrate size of 250 mm x 4.0 mm, it provides ample space for complex patterns and detailed features.

Key Features and Specifications

The ERA-Chrom eraTX 120 Si 3 µm is designed with cutting-edge technology to deliver exceptional results. Here are some of its standout features:

• High Resolution: Achieve precise details with a 3 µm resolution, perfect for demanding manufacturing processes.
• Substrate Size: With dimensions of 250 mm x 4.0 mm, this mask offers ample space for intricate designs.
• Si Substrate: The use of silicon substrate ensures stability, durability, and superior performance.

This photomask is not just a tool; it's a commitment to quality and precision, designed to meet the highest standards of the semiconductor industry.

Applications and Benefits

The ERA-Chrom eraTX 120 Si 3 µm is versatile and highly practical, making it suitable for a wide range of applications:

• Microelectronics: Essential for manufacturing advanced semiconductor devices and integrated circuits.
• Optical Devices: Perfect for producing complex optical components with precision alignment.

With its superior resolution and robust construction, this photomask can help you achieve unparalleled results in your engineering projects. Invest in the ERA-Chrom eraTX 120 Si 3 µm and experience the difference that quality and precision can make.